Medium wave infrared heater for wafer

Mon, 22 Jun 2026 19:30:31 +0800

Out on the fab floor, you know how it goes: a 0.5°C drift in bake temperature can shift critical dimensions by nanometers and wipe out hours of lithography work. Medium wave infrared heaters are built to stop that drift before it shows up. What actually matters under the hood Medium wave IR dumps energy straight into the photoresist and substrate—fast ramp, controlled soak. We hold wafer-level uniformity at ±0.1°C across the bake zone, and setpoint stability stays within ±0.2°C under load. Emissivity is tuned for silicon and the usual films, so you don’t get overshoot during soft bake and hard bake. The heater body is cleanroom-compatible, rated for ISO Class 1–100, with surfaces and seals chosen to keep particle generation at zero while it runs. Repeatability is baked into the thermal profile: every batch hits the same thermal budget, cycle after cycle. Why it sticks in photoresist processing Soft bake is about pulling solvent out and controlling film stress. Hard bake locks in adhesion and etch resistance. With medium wave IR, those steps stay inside tight thermal windows, so line-width roughness drops and temperature-driven defects don’t get a foothold. That translates to fewer reworks, higher first-pass yield, and CD control you can count on. The heating is targeted, so energy use comes down, and the reliability holds up for 24/7 operation without unplanned downtime. What you need to get right on install Installation comes down to precise optical alignment and a clean power window—voltage and connector termination have to match the host tool. Medium wave gives excellent uniformity, but the heater has to be matched to wafer size and chuck geometry. You’ll run a short commissioning period to tune emissivity for your film stack. Once it’s set, the process stays stable, and maintenance stays minimal.

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Medium wave infrared heater for wafer